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Titolo:
13.56 MHz hollow cathode jet matrix plasma source for large area surface coating
Autore:
Mildner, M; Korzec, D; Engemann, J;
Indirizzi:
Univ Gesamthsch Wuppertal, Microstruct Res Ctr, D-42287 Wuppertal, GermanyUniv Gesamthsch Wuppertal Wuppertal Germany D-42287 7 Wuppertal, Germany
Titolo Testata:
SURFACE & COATINGS TECHNOLOGY
fascicolo: 1-3, volume: 112, anno: 1999,
pagine: 366 - 372
SICI:
0257-8972(199902)112:1-3<366:1MHCJM>2.0.ZU;2-2
Fonte:
ISI
Lingua:
ENG
Keywords:
hexamethyldisiloxane; high rate deposition; large area coating; multijet plasma source; plasma processing; remote polymerization; RF hollow cathode discharge;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
13
Recensione:
Indirizzi per estratti:
Indirizzo: Korzec, D Univ42287mthsch Wuppertal, Microstruct Res Ctr, Obere Lichtenpl Str 336, D- Univ Gesamthsch Wuppertal Obere Lichtenpl Str 336 Wuppertal Germany D-42287
Citazione:
M. Mildner et al., "13.56 MHz hollow cathode jet matrix plasma source for large area surface coating", SURF COAT, 112(1-3), 1999, pp. 366-372

Abstract

A novel jet matrix plasma source (JEMPS) for large area film deposition ispresented. A high density plasma is produced by use of low temperature plasma jets extracted from 13.56 MHz hollow cathode discharges. A prototype ofJEMPS is realized as the matrix of 7 x 11 plasma jets. The influence of gas flow, radio frequency (RF) power and pressure on the ion concentration isinvestigated. The typical working conditions of JEMPS are discharge gas flow 500-1000 seem, pressure 30-100 Pa and RF power up to 400 W. The ion concentration measured under such conditions by use of a double Langmuir probe amounts up to 7 x 10(10) cm(-3) for argon plasma jets. Local variation of the ion concentration in a plane parallel to the anode decreases from 35% to5% if the distance from the anode increases from 10 to 45 mm. A remote plasma deposition process is carried out with an oxygen plasma and the siliconorganic monomer hexamethyldisiloxane and has a pressure range of between 30 and 100 Pa. The actual maximum deposition rate is 366 nm min(-1). The local film thickness variation is <20%. (C) 1999 Elsevier Science S.A. All rights reserved.

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Documento generato il 28/09/20 alle ore 05:51:10