Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
Effects of phase and thickness of cobalt silicide on field emission properties of silicon emitters
Autore:
Yoon, YJ; Kim, GB; Baik, HK;
Indirizzi:
Yonsei Univ, Dept Met Engn, Seodaemun Ku, Seoul 120749, South Korea YonseiUniv Seoul South Korea 120749 aemun Ku, Seoul 120749, South Korea
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
fascicolo: 2, volume: 17, anno: 1999,
pagine: 627 - 631
SICI:
1071-1023(199903/04)17:2<627:EOPATO>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; INSTABILITY; FABRICATION; COMPOUND; TIPS; SI;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
18
Recensione:
Indirizzi per estratti:
Indirizzo: Baik, HK Yonsei Univ, Dept Met Engn, Seodaemun Ku, Seoul 120749, South Korea Yonsei Univ Seoul South Korea 120749 Seoul 120749, South Korea
Citazione:
Y.J. Yoon et al., "Effects of phase and thickness of cobalt silicide on field emission properties of silicon emitters", J VAC SCI B, 17(2), 1999, pp. 627-631

Abstract

For solving the drawbacks of silicon emitters, emitters coated with cobaltsilicide were developed in this study. The cobalt silicide emitters showedenhanced emission properties including I-V characteristics and long-term current stability compared to bare silicon emitters. This was mainly caused by a reduction of the effective work function and the formation of a chemically stable surface. However, the electron emission characteristics differed according to the phase and thickness of the cobalt silicide. Detailed results about the effect of the phase and thickness of cobalt silicide on electron emission are discussed. (C) 1999 American Vacuum Society. [S0734-211X(99)11102-8].

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 11/07/20 alle ore 07:52:59