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Titolo:
SURFACE SMOOTHING DURING SPUTTERING - MOBILE VACANCIES VERSUS ADATOM DETACHMENT AND DIFFUSION
Autore:
MURTY MVR; COWLES B; COOPER BH;
Indirizzi:
CORNELL UNIV,ATOM & SOLID STATE PHYS LAB ITHACA NY 14853 RICE UNIV,DEPT MECH ENGN & MAT SCI HOUSTON TX 77005
Titolo Testata:
Surface science
fascicolo: 3, volume: 415, anno: 1998,
pagine: 328 - 335
SICI:
0039-6028(1998)415:3<328:SSDS-M>2.0.ZU;2-Y
Fonte:
ISI
Lingua:
ENG
Soggetto:
BOMBARDMENT-INDUCED DEFECTS; ION-BOMBARDMENT; ROUGHENING INSTABILITY; PT(111); EPITAXY; CU(001); GE(001); GROWTH; STM;
Keywords:
ADATOMS; COMPUTER SIMULATIONS; SPUTTERING; SURFACE DIFFUSION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
27
Recensione:
Indirizzi per estratti:
Citazione:
M.V.R. Murty et al., "SURFACE SMOOTHING DURING SPUTTERING - MOBILE VACANCIES VERSUS ADATOM DETACHMENT AND DIFFUSION", Surface science, 415(3), 1998, pp. 328-335

Abstract

Surface smoothing during sputtering can occur through both vacancy diffusion and adatom diffusion. In this paper, using kinetic Monte Carlosimulations, we investigate the kinetic consequences of smoothing with either mechanism acting alone. Quasi-layer-by-layer sputtering and an approximately Arrhenius variation of pit density during submonolayersputtering are observed with both types of surface smoothing. However, the two mechanisms result in significant differences in the pit sizedistribution for submonolayer sputtering and the vacancy coverage at which the maxima of the anti-Bragg specular beam intensity oscillations occur during layer-by-layer sputtering. These and other experimentally observable quantities are investigated as possible ways to determine the relative importance of the two smoothing mechanisms. (C) 1998 Elsevier Science B.V.,All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 27/11/20 alle ore 00:59:24