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Titolo:
The role of sulfur during Mo etching using SF6 and Cl-2 gas chemistries
Autore:
Baek, KH; Yun, SJ; Park, JM; Yoon, YS; Nam, KS; Kwon, KH; Kim, CI;
Indirizzi:
Elect & Telecommun Res Inst, Semicond Div, Taejon 305600, South Korea Elect & Telecommun Res Inst Taejon South Korea 305600 05600, South Korea Hanseo Univ, Dept Elect Engn, Seosan Si 356820, Chung Nam, South Korea Hanseo Univ Seosan Si Chung Nam South Korea 356820 Chung Nam, South Korea Anyang Univ, Dept Elect Engn, Anyang Si 430714, Kyunggi Do, South Korea Anyang Univ Anyang Si Kyunggi Do South Korea 430714 unggi Do, South Korea
Titolo Testata:
JOURNAL OF MATERIALS SCIENCE LETTERS
fascicolo: 17, volume: 17, anno: 1998,
pagine: 1483 - 1486
SICI:
0261-8028(19980901)17:17<1483:TROSDM>2.0.ZU;2-0
Fonte:
ISI
Lingua:
ENG
Soggetto:
SILICIDATION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
8
Recensione:
Indirizzi per estratti:
Indirizzo: Baek, KH Electouthelecommun Res Inst, Semicond Div, Yusong POB 106, Taejon305600, S Elect & Telecommun Res Inst Yusong POB 106 Taejon South Korea 305600
Citazione:
K.H. Baek et al., "The role of sulfur during Mo etching using SF6 and Cl-2 gas chemistries", J MAT SCI L, 17(17), 1998, pp. 1483-1486


ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 05/12/20 alle ore 01:42:02