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Titolo:
VARIATION OF RADIAL PLASMA-DENSITY PROFILE WITH THE EXCITATION-FREQUENCY IN A MAGNETRON-TYPE PLASMA
Autore:
WICKRAMANAYAKA S; LI YL; IIZUKA S; TAKAGI K; NAKAGAWA Y; TSUKADA T; SATO N;
Indirizzi:
ANELVA CORP,3-5-8 YOTSUYA FUCHU TOKYO 183 JAPAN KOKUSAI ELECT CO LTD,SENDAI RES LAB SENDAI MIYAGI 98131 JAPAN TOHOKU UNIV,DEPT ELECT ENGN,AOBA KU SENDAI MIYAGI 98077 JAPAN
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS
fascicolo: 4A, volume: 37, anno: 1998,
pagine: 2035 - 2038
SICI:
0021-4922(1998)37:4A<2035:VORPPW>2.0.ZU;2-G
Fonte:
ISI
Lingua:
ENG
Soggetto:
DISCHARGE PLASMA; RF DISCHARGES; POWER; ION; MHZ; MICROWAVE;
Keywords:
MAGNETRON-TYPE PLASMA; RADIAL PLASMA UNIFORMITY; PLASMA EXCITATION FREQUENCY;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
22
Recensione:
Indirizzi per estratti:
Citazione:
S. Wickramanayaka et al., "VARIATION OF RADIAL PLASMA-DENSITY PROFILE WITH THE EXCITATION-FREQUENCY IN A MAGNETRON-TYPE PLASMA", JPN J A P 1, 37(4A), 1998, pp. 2035-2038

Abstract

The variation of the radial profile of plasma density with the excitation frequency was investigated using a magnetron-type plasma source. The plasma source is comprised of a cylindrical shaped rf electrode and two annular magnets attached to the outer surface of the rf electrode. As the excitation frequency of the plasma, 13.56 MHz. 40 MHz were used. The radial profile of plasma density was observed in the downstream at 12 cm below the axial center of the rf electrode. Measurements were carried out for Ar plasma for pressures < 10 mTorr. The applied rfpower varied from 200W to 1500W. The radial profile of the plasma density at a given distance from the axial center of the rf electrode changes with the change of excitation frequency. When the excitation frequency is 40 MHz, a radially uniform plasma could be obtained 12 cm below the axial center of the rf electrode. The nonuniformity of this plasma over an area of 300 mm diameter is < +/-5% regardless of the applied rf power. A change of pressure slightly affects the radial uniformity of the plasma. Plasmas produced by two other frequencies show a higher nonuniformity at the same distance from the axial center.

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Documento generato il 15/07/20 alle ore 08:21:06