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Titolo:
DEPOSITION OF MOLYBDENUM THIN-FILMS BY AN ALTERNATE SUPPLY OF MOCL5 AND ZN
Autore:
JUPPO M; VEHKAMAKI M; RITALA M; LESKELA M;
Indirizzi:
UNIV HELSINKI,DEPT CHEM FIN-00014 HELSINKI FINLAND
Titolo Testata:
Journal of vacuum science & technology. A. Vacuum, surfaces, and films
fascicolo: 5, volume: 16, anno: 1998,
pagine: 2845 - 2850
SICI:
0734-2101(1998)16:5<2845:DOMTBA>2.0.ZU;2-L
Fonte:
ISI
Lingua:
ENG
Soggetto:
ATOMIC LAYER EPITAXY; CHEMICAL-VAPOR-DEPOSITION; COPPER; BARRIERS; OXIDE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
26
Recensione:
Indirizzi per estratti:
Citazione:
M. Juppo et al., "DEPOSITION OF MOLYBDENUM THIN-FILMS BY AN ALTERNATE SUPPLY OF MOCL5 AND ZN", Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(5), 1998, pp. 2845-2850

Abstract

Molybdenum thin films were deposited onto both soda lime glass and Al2O3 film by an alternate supply of MoCl5 and Zn. Zinc was used as a reducing agent. The film growth was performed over a temperature range of 400-500 degrees C in order to study the temperature effect on the growth. In addition to the growth temperature, the purge length after zinc was also seen to have a considerable effect on the growth. The films were analyzed by energy dispersive x-ray spectroscopy, scanning electron microscopy, elastic recoil detection analysis, x-ray diffraction and four point resistance measurements in order to determine their chemical and physical characteristics. (C) 1998 American Vacuum Society. [S0734-2101(98)01405-5].

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 21/09/20 alle ore 12:08:22