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Titolo:
APPLICATION OF A TOROIDAL PLASMA SOURCE TO TIN THIN-FILM DEPOSITION
Autore:
ZHANG BC; CROSS RC;
Indirizzi:
UNIV SYDNEY,DEPT PLASMA PHYS SYDNEY NSW 2006 AUSTRALIA
Titolo Testata:
Journal of vacuum science & technology. A. Vacuum, surfaces, and films
fascicolo: 4, volume: 16, anno: 1998,
pagine: 2016 - 2020
SICI:
0734-2101(1998)16:4<2016:AOATPS>2.0.ZU;2-O
Fonte:
ISI
Lingua:
ENG
Soggetto:
REACTIVELY SPUTTERED TIN; EVAPORATION; DIFFUSION; SILICON; BARRIER;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
13
Recensione:
Indirizzi per estratti:
Citazione:
B.C. Zhang e R.C. Cross, "APPLICATION OF A TOROIDAL PLASMA SOURCE TO TIN THIN-FILM DEPOSITION", Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2016-2020

Abstract

A toroidal plasma source for plasma deposition at the University of Sydney (PLADEPUS) has been developed for studies of deposition of thin films, such as titanium nitride (TiN). This article describes measurements of the plasma parameters at a low rf power input, the experimental setup of the preliminary thin film deposition and the method of titanium (Ti) atom injection into the plasma by using a small current Ti are. The microstructure of the TiN thin films is analyzed and the results are presented. (C) 1998 American Vacuum Society. [S0734-2101 (98)04504-7].

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 25/09/20 alle ore 00:31:43