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Titolo:
HIGH-RATE DEPOSITION OF LINBO3 FILMS BY THERMAL PLASMA SPRAY CVD
Autore:
YAMAGUCHI N; HATTORI T; TERASHIMA K; YOSHIDA T;
Indirizzi:
UNIV TOKYO,GRAD SCH,DEPT MET & SCI MAT,BUNKYO KU,HONGO 7-3-1 TOKYO 1138656 JAPAN UNIV TOKYO,FAC ENGN,BUNKYO KU TOKYO 1138656 JAPAN
Titolo Testata:
Thin solid films
fascicolo: 1-2, volume: 316, anno: 1998,
pagine: 185 - 188
SICI:
0040-6090(1998)316:1-2<185:HDOLFB>2.0.ZU;2-J
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL VAPOR-DEPOSITION; EXCIMER-LASER ABLATION; LITHIUM-NIOBATE; THIN-FILMS; EPITAXIAL-GROWTH;
Keywords:
LINBO3 FILMS; SAPPHIRE SUBSTRATE; HIGH-RATE DEPOSITION; THERMAL PLASMA SPRAY CHEMICAL VAPOR DEPOSITION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
11
Recensione:
Indirizzi per estratti:
Citazione:
N. Yamaguchi et al., "HIGH-RATE DEPOSITION OF LINBO3 FILMS BY THERMAL PLASMA SPRAY CVD", Thin solid films, 316(1-2), 1998, pp. 185-188

Abstract

LiNbO3 films were prepared by a thermal plasma spray chemical vapor deposition method using liquid source material. Preferentially (110)-oriented LiNbO3 films were obtained on sapphire (110) substrates with the deposition rate of 0.1 mu m/min, which was 10-100 times faster than those of other conventional vapor phase deposition methods. Moreover, large-area deposition over a 5-inch diameter could also be confirmed. These results demonstrate the effectiveness of this method for high-rate, large-area deposition of LiNbO3 films. (C) 1998 Elsevier Science S. A.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 24/10/20 alle ore 12:05:51