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Titolo:
PREPARATION OF TI-AL GRADIENT COMPOSITE FILMS BY SPUTTERING
Autore:
TAKEDA F; NAKAJIMA T;
Indirizzi:
TOYAMA NATL COLL TECHNOL TOYAMA 939 JAPAN
Titolo Testata:
Thin solid films
fascicolo: 1-2, volume: 316, anno: 1998,
pagine: 68 - 72
SICI:
0040-6090(1998)316:1-2<68:POTGCF>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
MAGNETRON;
Keywords:
SPUTTERING; SOLENOID COIL; GRADIENT COMPOSITE; TITANIUM ALUMINIDE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
4
Recensione:
Indirizzi per estratti:
Citazione:
F. Takeda e T. Nakajima, "PREPARATION OF TI-AL GRADIENT COMPOSITE FILMS BY SPUTTERING", Thin solid films, 316(1-2), 1998, pp. 68-72

Abstract

Titanium aluminide thin films have been deposited on quartz plates byDC magnetron sputtering with a solenoid coil. A round shaped Ti and Al complex disk was employed as a target. In our sputtering system, because the spatial position of plasma on the target surface can be controlled by the solenoid coil current, the in-depth concentration profileof Ti and Al can be controlled by changing the solenoid coil current. Highly oriented Ti3Al, TiAl and TiAl3 films were synthesized from onecomplex Ti and Al target at 400 degrees C by changing the solenoid coil current. Gradient composite him of these titanium aluminides could also be fabricated by changing the solenoid coil current. (C) 1998 Elsevier Science S.A.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 07/08/20 alle ore 20:35:06