Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
A SIMULATION STUDY ON LOT RELEASE CONTROL, MASK SCHEDULING, AND BATCHSCHEDULING IN SEMICONDUCTOR WAFER FABRICATION FACILITIES
Autore:
KIM YD; LEE DH; KIM JU; ROH HK;
Indirizzi:
KOREA ADV INST SCI & TECHNOL TAEJON SOUTH KOREA SAMSUNG SDS SEOUL SOUTH KOREA
Titolo Testata:
Journal of manufacturing systems
fascicolo: 2, volume: 17, anno: 1998,
pagine: 107 - 117
SICI:
0278-6125(1998)17:2<107:ASSOLR>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
SHOP-FLOOR CONTROL; ORDER RELEASE; STRATEGIES; SYSTEMS; PERFORMANCE; INDUSTRY; MODELS; ISSUES;
Keywords:
LOADING AND SCHEDULING; PRODUCTION CONTROL; SCHEDULING AND SEQUENCING TECHNIQUES; HEURISTIC METHODS; SIMULATION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
25
Recensione:
Indirizzi per estratti:
Citazione:
Y.D. Kim et al., "A SIMULATION STUDY ON LOT RELEASE CONTROL, MASK SCHEDULING, AND BATCHSCHEDULING IN SEMICONDUCTOR WAFER FABRICATION FACILITIES", Journal of manufacturing systems, 17(2), 1998, pp. 107-117

Abstract

This paper focuses on production scheduling in semiconductor wafer fabrication. Included in this study are decision problems of lot releasecontrol (to determine the time and quantity of wafers to release intothe wafer fab), mask scheduling (to determine the time to change masks in photolithographic expose workstations), and batch scheduling (to determine the number of lots to be produced simultaneously in a batch and the processing sequence of batches in front of batch processing workstations such as cleaning and oxidation workstations). Unlike previous research, in which these three problems are dealt with separately the three problems are considered simultaneously using simulation, and new rules for the three problems are suggested in this study. Moreover, the setup time (mask change time) and the processing time were considered separately in the photolithographic expose workstations. Simulation results snow that the new rules give better performance than existing rules with respect to throughput rate, flow time, and work-in-process inventory.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 27/01/20 alle ore 16:49:02