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Titolo:
MAGNETISM AND ITS DEPENDENCE ON ANNEALING TEMPERATURE FOR SPUTTERED CO CU MULTILAYER/
Autore:
GAO RW; LIU YH; YAN SS; ZHANG DH; ZHANG L;
Indirizzi:
SHANDONG UNIV,DEPT PHYS JINAN 250100 PEOPLES R CHINA
Titolo Testata:
JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
fascicolo: 2, volume: 14, anno: 1998,
pagine: 139 - 142
SICI:
1005-0302(1998)14:2<139:MAIDOA>2.0.ZU;2-E
Fonte:
ISI
Lingua:
ENG
Soggetto:
INTERFACE MAGNETISM; ANISOTROPY; MAGNETIZATION; FILMS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
13
Recensione:
Indirizzi per estratti:
Citazione:
R.W. Gao et al., "MAGNETISM AND ITS DEPENDENCE ON ANNEALING TEMPERATURE FOR SPUTTERED CO CU MULTILAYER/", JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY, 14(2), 1998, pp. 139-142

Abstract

Magnetism and its dependence on annealing temperature for r.f. sputtered Co/Cu multilayers have been investigated. It was found that the easy magnetization axes of the films are parallel to the substrate and the magnetic properties of both as-sputtered and annealed multilayers are isotropic in the film plane. The coercive field H-c is 4.8 kA/m andthe ratio of remanence-to-saturation magnetization M-Gamma/M-s is about 0.73 for as-sputtered samples. Both H-c and M-Gamma/M-s increase with increasing annealing temperatures, especially when annealing temperatures are higher than 400 degrees C. These experimental results can be interpreted using the ferromagnetic exchange coupling and the pinning theory of the coercivity.

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Documento generato il 19/01/20 alle ore 11:45:57