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Titolo:
FABRICATION OF BORON-DOPED CVD DIAMOND MICROELECTRODES
Autore:
COOPER JB; PANG S; ALBIN S; ZHENG JL; JOHNSON RM;
Indirizzi:
OLD DOMINION UNIV,DEPT CHEM NORFOLK VA 23529 OLD DOMINION UNIV,DEPT ELECT & COMP ENGN NORFOLK VA 23529
Titolo Testata:
Analytical chemistry
fascicolo: 3, volume: 70, anno: 1998,
pagine: 464 - 467
SICI:
0003-2700(1998)70:3<464:FOBCDM>2.0.ZU;2-F
Fonte:
ISI
Lingua:
ENG
Soggetto:
ELECTROCHEMICAL-BEHAVIOR; SUPPORTING ELECTROLYTE; FILM ELECTRODES; THIN-FILMS; MEDIA;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
20
Recensione:
Indirizzi per estratti:
Citazione:
J.B. Cooper et al., "FABRICATION OF BORON-DOPED CVD DIAMOND MICROELECTRODES", Analytical chemistry, 70(3), 1998, pp. 464-467

Abstract

Diamond microelectrodes are fabricated using microwave plasma CVD forthe growth of electrically conducting single microcrystallite diamonds as well as diamond films on etched tungsten wires which are subsequently sealed in glass. The electroactive diamond is exposed by either mechanical polishing or by chemical etching of the glass. The resultingmicroelectrodes yield steady-state cyclic voltammograms at low scan rates.

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Documento generato il 26/11/20 alle ore 20:27:27