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Titolo:
VERY-HIGH-RATE REACTIVE SPUTTERING OF ALUMINA HARD COATINGS
Autore:
SCHNEIDER JM; SPROUL WD; CHIA RWJ; WONG MS;
Indirizzi:
NORTHWESTERN UNIV,BIRL,1801 MAPLE AVE EVANSTON IL 60201 UNIV HULL,RCSE KINGSTON HULL HU6 7RX N HUMBERSIDE ENGLAND
Titolo Testata:
Surface & coatings technology
fascicolo: 2-3, volume: 96, anno: 1997,
pagine: 262 - 266
SICI:
0257-8972(1997)96:2-3<262:VRSOAH>2.0.ZU;2-X
Fonte:
ISI
Lingua:
ENG
Soggetto:
DEPOSITION; FILMS; AL2O3;
Keywords:
ALUMINA; HIGH DEPOSITION RATE; MAGNETRON SPUTTERING;
Tipo documento:
Article
Natura:
Periodico
Citazioni:
19
Recensione:
Indirizzi per estratti:
Citazione:
J.M. Schneider et al., "VERY-HIGH-RATE REACTIVE SPUTTERING OF ALUMINA HARD COATINGS", Surface & coatings technology, 96(2-3), 1997, pp. 262-266

Abstract

A very-high-rate reactive magnetron sputtering deposition process foralumina hard coatings at substrate temperatures less than or equal to250 degrees C has been developed. Utilizing pulsed DC power to sputter Al+AlOx, off the target surface and partial pressure control of the reactive gas to maintain a certain partial pressure value (accuracy ofbetter than 0.005 mtorr), fully dense. transparent alumina coatings could be produced at 76% of the metal deposition rate. The coatings have an elastic modulus of 140 GPa, a hardness of 12 GPa, a chemical composition close to stoichiometric, and a refractive index of 1.65. The influence of the O-2 partial pressure on the deposition rate, optical and mechanical properties is discussed. (C) 1997 Elsevier Science S.A.

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Documento generato il 26/09/20 alle ore 05:35:13