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Titolo:
Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
Autore:
Aarik, J; Aidla, A; Kiisler, AA; Uustare, T; Sammelselg, V;
Indirizzi:
Tartu State Univ, Inst Mat Sci, EE-2400 Tartu, Estonia Tartu State Univ Tartu Estonia EE-2400 t Mat Sci, EE-2400 Tartu, Estonia Tartu State Univ, Inst Phys, EE-2400 Tartu, Estonia Tartu State Univ Tartu Estonia EE-2400 Inst Phys, EE-2400 Tartu, Estonia
Titolo Testata:
THIN SOLID FILMS
fascicolo: 1-2, volume: 340, anno: 1999,
pagine: 110 - 116
SICI:
0040-6090(19990226)340:1-2<110:IOSTOA>2.0.ZU;2-X
Fonte:
ISI
Lingua:
ENG
Soggetto:
TANTALUM OXIDE; DEPOSITION; MORPHOLOGY; EPITAXY; HAFNIA; TIO2;
Keywords:
atomic layer growth; hafnium; oxides;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
16
Recensione:
Indirizzi per estratti:
Indirizzo: Aarik, J Tartu State Univ, Inst Mat Sci, 18 Ulikodi St, EE-2400 Tartu, Estonia Tartu State Univ 18 Ulikodi St Tartu Estonia EE-2400 tu, Estonia
Citazione:
J. Aarik et al., "Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films", THIN SOL FI, 340(1-2), 1999, pp. 110-116

Abstract

Atomic layer growth of hafnium dioxide from HfCl4 and H2O has been studiedat substrate temperatures ranging From 180-600 degrees C. A quartz crystalmicrobalance was used for the real-time investigation of deposition kinetics and processes affecting the growth rate. It was shown that the layer-by-layer growth was self-limited at temperatures above 180 degrees C. The dataof ex situ measurements revealed that the structure. density and optical properties of the films depended on the growth temperature. The absorption coefficient of amorphous films grown at 225 degrees C was below 40 mm(-1) inthe spectral range of 260-850 nm. The refractive index of the films grown at 225 degrees C was 2.2 and 2.0 at 260 and 580 nm, respectively. The polycrystalline films with monoclinic structure grown at 500 degrees C had about5% higher refractive index but more than an order of magnitude higher optical losses caused by light absorption and/or scattering. (C) 1999 Elsevier Science S.A. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 04/12/20 alle ore 19:55:48