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Titolo:
Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods
Autore:
Sammelselg, V; Aarik, J; Aidla, A; Kasikov, A; Heikinheimo, E; Peussa, M; Niinisto, L;
Indirizzi:
Tartu State Univ, Inst Phys, EE-51014 Tartu, Estonia Tartu State Univ Tartu Estonia EE-51014 st Phys, EE-51014 Tartu, Estonia Tartu State Univ, Inst Mat Sci, EE-51014 Tartu, Estonia Tartu State Univ Tartu Estonia EE-51014 Mat Sci, EE-51014 Tartu, Estonia Helsinki Univ Technol, Met Lab, FIN-02015 Espoo, Finland Helsinki Univ Technol Espoo Finland FIN-02015 , FIN-02015 Espoo, Finland Helsinki Univ Technol, Inorgan & Analyt Chem Lab, FIN-02015 Espoo, FinlandHelsinki Univ Technol Espoo Finland FIN-02015 , FIN-02015 Espoo, Finland
Titolo Testata:
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
fascicolo: 3, volume: 14, anno: 1999,
pagine: 523 - 527
SICI:
0267-9477(199903)14:3<523:CATDOT>2.0.ZU;2-P
Fonte:
ISI
Lingua:
ENG
Soggetto:
ELECTRON-PROBE MICROANALYSIS; ATOMIC LAYER EPITAXY; ABSORPTION CORRECTION; MORPHOLOGY; DEPOSITION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
31
Recensione:
Indirizzi per estratti:
Indirizzo: Sammelselg, V Tartu State Univ, Inst Phys, EE-51014 Tartu, Estonia Tartu State Univ Tartu Estonia EE-51014 014 Tartu, Estonia
Citazione:
V. Sammelselg et al., "Composition and thickness determination of thin oxide films: comparison ofdifferent programs and methods", J ANAL ATOM, 14(3), 1999, pp. 523-527

Abstract

The mass thickness of thin titanium oxide and hafnium oxide films grown bythe atomic layer deposition method on silicon substrates was determined using EPMA data and STRATA and FLA programs. The results of the two programs coincided well if a set of relative intensities was measured at different energies of probe electrons. Comparative measurements by XRF gave higher values. Comparing the mass thicknesses of films measured by EPMA and absolute thicknesses determined by optical spectrophotometry, ellipsometry and profilometry, the densities of polycrystalline films were estimated. Values of 3.3 +/- 0.2 and 8.7 +/- 0.2 g cm(-3) were obtained for TiO2 anatase grown at300 degrees C and monoclinic HfO2 grown at 600 degrees C, respectively. Titanium oxide films deposited at 100 degrees C contained significant amountsof chlorine and hydroxyl groups (7.2 +/- 0.7 and 6.9 +/- 0.9 mass-%, respectively).

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 04/12/20 alle ore 19:41:32