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Titolo:
Testing a furfuryl alcohol resin as a negative photoresist
Autore:
Sthel, M; Rieumont, J; Martinez, R;
Indirizzi:
State Univ N Fluminense, Ctr Sci & Technol, Campos, RJ, Brazil State Univ N Fluminense Campos RJ Brazil i & Technol, Campos, RJ, Brazil
Titolo Testata:
POLYMER TESTING
fascicolo: 1, volume: 18, anno: 1999,
pagine: 47 - 50
SICI:
0142-9418(1999)18:1<47:TAFARA>2.0.ZU;2-5
Fonte:
ISI
Lingua:
ENG
Soggetto:
TRIFLUOROACETIC-ACID; POLYMERIZATION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
6
Recensione:
Indirizzi per estratti:
Indirizzo: Sthel, M State,Univ N Fluminense, Ctr Sci & Technol, Ave Alberto Lamego 2000, Campos State Univ N Fluminense Ave Alberto Lamego 2000 Campos RJ Brazil
Citazione:
M. Sthel et al., "Testing a furfuryl alcohol resin as a negative photoresist", POLYM TEST, 18(1), 1999, pp. 47-50

Abstract

Poly(furfuryl alcohol) was prepared using methylene dichloride as solvent and trifluoroacetic acid as catalyst. Synthesis was monitored in order to achieve a desirable structure capable of crosslinking under the action of light. The resulting product was a soluble dark brown resin that gave remarkable photocrosslinking performance as a negative photoresist when exposed toultraviolet light, giving photolithographic patterns with a resolution of about 5 mu m. (C) 1999 Elsevier Science Ltd. All rights reserved.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 20/09/20 alle ore 23:27:15