Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
Ex situ formation of oxide-interlayer-mediated-epitaxial CoSi2 film using Ti capping
Autore:
Kim, GB; Kwak, JS; Baik, HK; Lee, SM;
Indirizzi:
Yonsei Univ, Dept Met Engn, Seoul 120749, South Korea Yonsei Univ Seoul South Korea 120749 Met Engn, Seoul 120749, South Korea Kangweon Natl Univ, Dept Mat Engn, Chunchon 200701, South Korea Kangweon Natl Univ Chunchon South Korea 200701 nchon 200701, South Korea
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
fascicolo: 1, volume: 17, anno: 1999,
pagine: 162 - 165
SICI:
1071-1023(199901/02)17:1<162:ESFOOC>2.0.ZU;2-W
Fonte:
ISI
Lingua:
ENG
Soggetto:
GROWTH; SYSTEM;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
16
Recensione:
Indirizzi per estratti:
Indirizzo: Kim, GB Yonsei Univ, Dept Met Engn, Seoul 120749, South Korea Yonsei UnivSeoul South Korea 120749 , Seoul 120749, South Korea
Citazione:
G.B. Kim et al., "Ex situ formation of oxide-interlayer-mediated-epitaxial CoSi2 film using Ti capping", J VAC SCI B, 17(1), 1999, pp. 162-165

Abstract

A modified oxide mediated epitaxy process using a single deposition and exsitu annealing by Ti capping has been developed in this study. With pure Co on Shiraki oxide, the reaction between Co and Si did not occur even at 800 degrees C during ex situ annealing, because of the adsorption of oxygen on the Co film, However, when the pure Co on the Shiraki oxide was capped byTi, a uniform Ti oxide surface layer was formed during the initial stage of annealing, which had a role to eliminate the adsorption of oxygen on the Co film. It led to uniform Co diffusion into the Si substrate through the Shiraki oxide, resulting in epitaxial CoSi2. A good channeling chi(min) value of 18% comparable to that of the Ti/Co bilayer system was measured in theepitaxial CoSi2 formed from this modified oxide mediated epitaxy process. (C) 1999 American Vacuum Society. [S0734-211X(99)02201-5].

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 07/08/20 alle ore 20:54:35