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Titolo:
Study on the spatial resolution of a furfuryl alcohol-negative photoresistusing a holographic system
Autore:
Sthel, M; Rieumont, J; Martinez, R;
Indirizzi:
Stateilniv N Fluminense, Ctr Sci & Technol, Campos dos Goytacazes, RJ, Braz State Univ N Fluminense Campos dos Goytacazes RJ Brazil acazes, RJ, Braz
Titolo Testata:
JOURNAL OF APPLIED POLYMER SCIENCE
fascicolo: 11, volume: 71, anno: 1999,
pagine: 1749 - 1751
SICI:
0021-8995(19990314)71:11<1749:SOTSRO>2.0.ZU;2-J
Fonte:
ISI
Lingua:
ENG
Soggetto:
TRIFLUOROACETIC-ACID; POLYMERIZATION;
Keywords:
spatial resolution; furfuryl alcohol; photoresist; holographic system;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
Citazioni:
9
Recensione:
Indirizzi per estratti:
Indirizzo: Sthel, M Statedosiv N Fluminense, Ctr Sci & Technol, Av Alberto Lamego 2000, Campos State Univ N Fluminense Av Alberto Lamego 2000 Campos dos Goytacazes RJ Brazil
Citazione:
M. Sthel et al., "Study on the spatial resolution of a furfuryl alcohol-negative photoresistusing a holographic system", J APPL POLY, 71(11), 1999, pp. 1749-1751

Abstract

A negative photoresist was obtained from furfury alcohol using methylene dichloride as a solvent and trifluoracetic acid as a catalyst. A holographicassembly with a blue laser failed to give interference patterns. However, a periodic interference pattern was printed on a film of furfuryl alcohol resin using an ultraviolet laser with a coherent beam at 360 nm. The period of the pattern was reproduced throughout the film and resulted about 0.46 mu m. Thus, the resin obtained was able to reach a resolution about 0.23 m. (C) 1999 John Wiley & Sons, Inc.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 20/09/20 alle ore 23:36:24