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Titolo:
Negative electron-beam nanofabrication resist using acid-catalyzed protection of polyphenol provided by phenylcarbinol
Autore:
Uchino, S; Yamamoto, J; Migitaka, S; Kojima, K; Hashimoto, M; Shiraishi, H;
Indirizzi:
Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan Hitachi Ltd Kokubunji Tokyo Japan 1858601 Kokubunji, Tokyo 1858601, Japan Hitachi Ltd, Electron Tube & Devices Div, Kokubunji, Tokyo 1858601, Japan Hitachi Ltd Kokubunji Tokyo Japan 1858601 Kokubunji, Tokyo 1858601, Japan Hitachi Chem Co, Yamazaki Works, Hitachi, Ibaraki 3178555, Japan Hitachi Chem Co Hitachi Ibaraki Japan 3178555 chi, Ibaraki 3178555, Japan
Titolo Testata:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
fascicolo: 6, volume: 16, anno: 1998,
pagine: 3684 - 3688
SICI:
1071-1023(199811/12)16:6<3684:NENRUA>2.0.ZU;2-W
Fonte:
ISI
Lingua:
ENG
Soggetto:
LITHOGRAPHY;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Engineering, Computing & Technology
--discip_EC--
Citazioni:
10
Recensione:
Indirizzi per estratti:
Indirizzo: Uchino, S Hitachi Ltd, Cent Res Lab, Kokubunji, Tokyo 1858601, Japan Hitachi Ltd Kokubunji Tokyo Japan 1858601 Tokyo 1858601, Japan
Citazione:
S. Uchino et al., "Negative electron-beam nanofabrication resist using acid-catalyzed protection of polyphenol provided by phenylcarbinol", J VAC SCI B, 16(6), 1998, pp. 3684-3688

Abstract

A high-resolution negative electron-beam (EB) lithography resist based on an acid-catalyzed protection reaction of a polyphenol enabled by a phenylcarbinol has been developed for nanofabrication. Polyphenol-3, which is synthesized by condensation of alpha, alpha, alpha' -tris(4-hydroxyphenyl)-1-ethyl-4-isopropylbenzene with m-cresol, was selected as the most suitable matrix resin for the resist. 1,3,5-tris[1-(1-hydroxyethyl)]benzene (Triol-2) was found to be the best protection reagent among the six phenylcarbinols evaluated. Line-and-space patterns of 80 nm with edge roughness of less than 10 nm were delineated by using a resist composed of Triol-2, diphenyliodonium triflate, and polyphenol-3 in conjunction with an EB writer (20 mu C/cm(2) at 50 kV). Spectroscopic studies clearly showed that the acid-catalyzed protection reaction of the polyphenol brought about by Triol-2 is responsible for the resist insolubilization. (C) 1998 American Vacuum Society. [S0734-211X(98)14806-0].

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 19/01/20 alle ore 11:41:31