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Titolo:
Ultrahigh-vacuum reaction apparatus to study synchrotron-radiation-stimulated processes
Autore:
Hirano, S; Yoshigoe, A; Nagasono, M; Mase, K; Ohara, J; Nonogaki, Y; Takeda, Y; Urisu, T;
Indirizzi:
Grad Univ Adv Studies, Inst Mol Sci, Okazaki, Aichi 4448585, Japan Grad Univ Adv Studies Okazaki Aichi Japan 4448585 i, Aichi 4448585, Japan Inst Mol Sci, Dept Vacuum UV Photosci, Okazaki, Aichi 4448585, Japan Inst Mol Sci Okazaki Aichi Japan 4448585 i, Okazaki, Aichi 4448585, Japan Denso Co Ltd, Res Labs, Aichi 4700111, Japan Denso Co Ltd Aichi Japan 4700111 Co Ltd, Res Labs, Aichi 4700111, Japan Nagoya4648603,rad Sch Engn, Dept Mat Sci & Engn, Chikusa Ku, Nagoya, AichiNagoya Univ Nagoya Aichi Japan 4648603 & Engn, Chikusa Ku, Nagoya, Aichi
Titolo Testata:
JOURNAL OF SYNCHROTRON RADIATION
, volume: 5, anno: 1998,
parte:, 6
pagine: 1363 - 1368
SICI:
0909-0495(19981101)5:<1363:URATSS>2.0.ZU;2-E
Fonte:
ISI
Lingua:
ENG
Soggetto:
REFLECTION ABSORPTION-SPECTROSCOPY; SURFACE;
Keywords:
synchrotron-radiation-stimulated processes; IR reflection absorption spectroscopy; etching; chemical vapour deposition; molecular beam epitaxy;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Physical, Chemical & Earth Sciences
Citazioni:
8
Recensione:
Indirizzi per estratti:
Indirizzo: Hirano, S Grad Univ Adv Studies, Inst Mol Sci, Okazaki, Aichi 4448585, Japan Grad Univ Adv Studies Okazaki Aichi Japan 4448585 448585, Japan
Citazione:
S. Hirano et al., "Ultrahigh-vacuum reaction apparatus to study synchrotron-radiation-stimulated processes", J SYNCHROTR, 5, 1998, pp. 1363-1368

Abstract

An ultrahigh-vacuum reaction apparatus to study synchrotron-radiation-stimulated processes has been constructed and placed on beamline 4B of the synchrotron radiation storage ring (UVSOR) at the Institute for Molecular Science. The apparatus is designed so that multiple synchrotron radiation precesses such as etching and chemical vapour deposition can be carried out successively without breaking the high vacuum. It is equipped with IR reflectionabsorption spectroscopy (IRRAS) apparatus and reflective high-energy electron diffraction (RHEED) apparatus for in situ observations. The basic parameters of the apparatus including etching and deposition rates have been measured. IRRAS using buried metal layer substrates has been confirmed to be avery useful method of analyzing the reaction mechanisms of the synchrotron-radiation-stimulated processes.

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Documento generato il 01/10/20 alle ore 07:42:25