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Titolo:
An in situ ex situ X-ray analysis system for thin sputtered films
Autore:
Malhotra, AK; Whitacre, JF; Zhao, ZB; Hershberger, J; Yalisove, SM; Bilello, JC;
Indirizzi:
Univ Michigan, Dept Mat Sci & Engn, Ann Arbor, MI 48109 USA Univ MichiganAnn Arbor MI USA 48109 Sci & Engn, Ann Arbor, MI 48109 USA
Titolo Testata:
SURFACE & COATINGS TECHNOLOGY
fascicolo: 1-2, volume: 110, anno: 1998,
pagine: 105 - 110
SICI:
0257-8972(19981110)110:1-2<105:AISESX>2.0.ZU;2-3
Fonte:
ISI
Lingua:
ENG
Soggetto:
DIFFRACTION; ORIENTATION; DEPOSITION; SCATTERING; APPARATUS;
Keywords:
molybdenum films; sputter deposition; texture; X-ray diffraction;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Engineering, Computing & Technology
Citazioni:
14
Recensione:
Indirizzi per estratti:
Indirizzo: Whitacre, JF UnivAMichigan, Dept Mat Sci & Engn, 2300 Hayward St, Ann Arbor, MI 48109 US Univ Michigan 2300 Hayward St Ann Arbor MI USA 48109 48109 US
Citazione:
A.K. Malhotra et al., "An in situ ex situ X-ray analysis system for thin sputtered films", SURF COAT, 110(1-2), 1998, pp. 105-110

Abstract

An in situ X-ray analysis system for thin sputtered films was developed. This set-up was designed to perform reflectivity, grazing incidence X-ray scattering, and texture analysis experiments on films as they are deposited. Beam alignment was facilitated by mounting a rotating anode tube tower on agoniometer which allowed both translation and rotation. The X-ray source could then be aligned with either a standard four-circle goniometer (ex situ) or a diffractometer designed around a high-vacuum sputter deposition system (in situ). Custom designed UHV beryllium windows allowed X-rays to enterand exit the sputter chamber. An Inel(R) curvilinear position sensitive X-ray detector capable of rapidly and simultaneously collecting diffracted intensities through a 90 degrees range with a resolution of similar to 0.02 degrees was used. To test system performance, Mo sputter depositions were studied. Diffraction patterns were collected in as little as 2 s. This data can provide information concerning grain size, texture, and strain evolutionwhich are free of the distortions associated with deposition interruption,thermal fluctuation, and surface oxide formation. (C) 1998 Elsevier Science S.A. All rights reserved.

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Documento generato il 15/07/20 alle ore 14:29:05