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Titolo:
MINIMUM ABERRATION DESIGNS WITH 2-LEVEL AND 4-LEVEL FACTORS
Autore:
WU CFJ; ZHANG RC;
Indirizzi:
UNIV WATERLOO,DEPT STAT & ACTUARIAL SCI WATERLOO N2L 3G1 ONTARIO CANADA NANKAI UNIV,DEPT MATH TIANJIN 300071 PEOPLES R CHINA
Titolo Testata:
Biometrika
fascicolo: 1, volume: 80, anno: 1993,
pagine: 203 - 209
SICI:
0006-3444(1993)80:1<203:MADW2A>2.0.ZU;2-8
Fonte:
ISI
Lingua:
ENG
Soggetto:
CONSTRUCTION;
Keywords:
DEFINING CONTRASTS GROUP; GROUPING; METHOD OF REPLACEMENT; RESOLUTION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
CompuMath Citation Index
Science Citation Index Expanded
Citazioni:
13
Recensione:
Indirizzi per estratti:
Citazione:
C.F.J. Wu e R.C. Zhang, "MINIMUM ABERRATION DESIGNS WITH 2-LEVEL AND 4-LEVEL FACTORS", Biometrika, 80(1), 1993, pp. 203-209

Abstract

For optimal assignment of factors to columns of a 4m2n design, we consider extensions of the minimum aberration criterion for the 2-level designs. Minimum aberration 4(1)2n and 4(2)2n designs in 16 and 32 runsare obtained and tabulated. Some results on the wordlength patterns and design classification are obtained.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 26/09/20 alle ore 12:07:58