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Titolo:
VERTICAL INHOMOGENEITY OF THE MAGNETIZATION REVERSAL IN ANTIFERROMAGNETICALLY COUPLED CO CU MULTILAYERS AT THE FIRST MAXIMUM/
Autore:
MATTHEIS R; ANDRA W; FRITZSCH L; LANGER J; SCHMIDT S;
Indirizzi:
INST PHYS HOCHTECHNOL JENA,PF 100 239 D-07702 JENA GERMANY
Titolo Testata:
Journal of applied physics
fascicolo: 10, volume: 76, anno: 1994,
parte:, 2
pagine: 6510 - 6512
SICI:
0021-8979(1994)76:10<6510:VIOTMR>2.0.ZU;2-0
Fonte:
ISI
Lingua:
ENG
Soggetto:
MAGNETORESISTANCE; LAYERS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
7
Recensione:
Indirizzi per estratti:
Citazione:
R. Mattheis et al., "VERTICAL INHOMOGENEITY OF THE MAGNETIZATION REVERSAL IN ANTIFERROMAGNETICALLY COUPLED CO CU MULTILAYERS AT THE FIRST MAXIMUM/", Journal of applied physics, 76(10), 1994, pp. 6510-6512

Abstract

Magnetization behavior in antiferromagnetically (AFM) coupled multilayer systems was calculated by using an atomic layer model. Comparisonswith the experimental results obtained on sputtered Co/Cu multilayersreveal remarkable differences in the magnetization reversal and in the field dependence of the magnetoresistance. Kerr loops measured from both sides of the stack display strong vertical differences. At the lower side near the Fe seed layer the magnetization reversal is in good agreement with that of our calculations whereas near the surface in large portions of the stack the AFM coupling is destroyed or varied. These effects are presumably caused by magnetic short circuits at defectsin the multilayer structure. Cross-section transmission electron microscopy reveals growth defects which seem to be responsible for the deviations from the calculated ideal behavior.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 22/09/20 alle ore 19:42:28