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Titolo:
IN-SITU SURFACE DIFFERENTIAL DIFFRACTION STUDY OF METAL MONOLAYER FORMATION BY UNDERPOTENTIAL DEPOSITION ON SILVER(111) ORIENTED SURFACES
Autore:
CHABALA ED; RAYMENT T;
Indirizzi:
UNIV CAMBRIDGE,CHEM LAB,DEPT CHEM,LENSFIELD RD CAMBRIDGE CB2 1EW ENGLAND UNIV CAMBRIDGE,CHEM LAB,DEPT CHEM CAMBRIDGE CB2 1EW ENGLAND
Titolo Testata:
Langmuir
fascicolo: 11, volume: 10, anno: 1994,
pagine: 4324 - 4329
SICI:
0743-7463(1994)10:11<4324:ISDDSO>2.0.ZU;2-I
Fonte:
ISI
Lingua:
ENG
Soggetto:
X-RAY-DIFFRACTION; ENERGY ELECTRON-DIFFRACTION; SINGLE-CRYSTAL GOLD; ELECTROSORPTION VALENCY; AQUEOUS-SOLUTIONS; ION ADSORPTION; LEAD; INSITU; POLYCRYSTALLINE; THALLIUM;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
62
Recensione:
Indirizzi per estratti:
Citazione:
E.D. Chabala e T. Rayment, "IN-SITU SURFACE DIFFERENTIAL DIFFRACTION STUDY OF METAL MONOLAYER FORMATION BY UNDERPOTENTIAL DEPOSITION ON SILVER(111) ORIENTED SURFACES", Langmuir, 10(11), 1994, pp. 4324-4329

Abstract

Surface differential diffraction was used to study the process of theformation of adsorbate layers of thallium and lead, by underpotentialdeposition (UPD), onto Ag(111) electrodes. It was possible to undertake real-time in, situ structural measurements during the formation of the adsorbate layers. The intensity of the differential diffraction peaks, as a function of potential in the underpotential region, was usedto monitor the growth of the adsorbate layers. Thallium UPD on Ag(111) was found to be a gradual process over a larger underpotential region, whereas the UPD of lead occurred rather abruptly and had a much smaller underpotential shift. This difference in behavior between the twosystems could be a reflection of the difference in the mechanisms of underpotential deposition for the two systems. The former could be a gradual adsorption process, while the latter a nucleation-growth process. It was also possible to measure the distance of the adsorbate planeon the substrate with respect to the interplanar spacing in the bulk of the latter. The thallium adsorbate layer gave a distance of 2.42 +/- 0.05 to 2.55 +/- 0.05 Angstrom, increasing with scan in the cathodicdirection. The lead adsorbate layer gave a distance of 3.00 +/- 0.05 Angstrom. From these distances, we inferred the probable adsorption sites of the adsorbate species on Ag(111).

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 05/12/20 alle ore 01:29:54