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Titolo:
CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR
Autore:
AARIK J; SIIMON H;
Indirizzi:
UNIV TARTU,INST EXPTL PHYS & TECHNOL,ULIKOOLI 18 2400 TARTU ESTONIA UNIV TARTU,INST EXPTL PHYS & TECHNOL,ULIKOOLI 18 2400 TARTU ESTONIA
Titolo Testata:
Applied surface science
fascicolo: 3, volume: 81, anno: 1994,
pagine: 281 - 287
SICI:
0169-4332(1994)81:3<281:COAIFA>2.0.ZU;2-2
Fonte:
ISI
Lingua:
ENG
Soggetto:
SURFACE KINETICS; GROWTH;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
18
Recensione:
Indirizzi per estratti:
Citazione:
J. Aarik e H. Siimon, "CHARACTERIZATION OF ADSORPTION IN FLOW-TYPE ATOMIC LAYER EPITAXY REACTOR", Applied surface science, 81(3), 1994, pp. 281-287

Abstract

Numerical model calculations describing the propagation of an adsorption wave in a low-pressure channel-type ALE reactor are carried out. The effect of channel parameters and flow rate of the carrier gas as well as diffusion and sticking coefficients of the precursor on the propagation of the adsorption wave are studied. It is shown that the surface density of adsorption sites and the diffusion coefficient of the precursor molecules can be determined from the precursor pulse delay time measurements. Using the time dependence of the precursor concentration or that of the surface coverage, both measured at the channel outlet, the sticking coefficient of the precursor can be calculated.

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Documento generato il 28/11/20 alle ore 12:26:13