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Titolo:
STUDY ON THE MECHANISM OF ALUMINUM NITRIDE SYNTHESIS BY CHEMICAL-VAPOR-DEPOSITION
Autore:
LI CZ; HU LM; YUAN WK; CHEN MH;
Indirizzi:
E CHINA UNIV SCI & TECHNOL,INST TECH CHEM PHYS,POB 258 SHANGHAI 200237 PEOPLES R CHINA
Titolo Testata:
Materials chemistry and physics
fascicolo: 2-3, volume: 47, anno: 1997,
pagine: 273 - 278
SICI:
0254-0584(1997)47:2-3<273:SOTMOA>2.0.ZU;2-P
Fonte:
ISI
Lingua:
ENG
Keywords:
ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; PROCESS MECHANISMS; SYNTHESIS; ULTRAFINE PARTICLES;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
16
Recensione:
Indirizzi per estratti:
Citazione:
C.Z. Li et al., "STUDY ON THE MECHANISM OF ALUMINUM NITRIDE SYNTHESIS BY CHEMICAL-VAPOR-DEPOSITION", Materials chemistry and physics, 47(2-3), 1997, pp. 273-278

Abstract

Ultrafine aluminum nitride particles were synthesized by chemical vapor deposition at 973-1273 K. Effects of reaction temperature, gas total how rate, aluminum chloride concentration on aluminum nitride particle morphology and particle size distribution were studied. The mechanism of the reaction between aluminum chloride and ammonia and the mechanisms for homogeneous formation of aluminum nitride particles and growth of aluminum nitride film by surface reactions were investigated.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 24/09/20 alle ore 10:59:46