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Titolo:
STUDY OF THE RELATIONSHIP BETWEEN CRYSTAL-STRUCTURE AND PHOTOSENSITIVITY OF PHTHALOCYANINE PIGMENTS
Autore:
OKA K; OKADA O;
Indirizzi:
FUJI XEROX CO LTD,MAT RES LAB MINAMIASHIGARA KANAGAWA 25001 JAPAN
Titolo Testata:
Journal of imaging science and technology
fascicolo: 6, volume: 37, anno: 1993,
pagine: 607 - 609
SICI:
1062-3701(1993)37:6<607:SOTRBC>2.0.ZU;2-I
Fonte:
ISI
Lingua:
ENG
Soggetto:
METAL-FREE PHTHALOCYANINE; RIETVELD ANALYSIS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
21
Recensione:
Indirizzi per estratti:
Citazione:
K. Oka e O. Okada, "STUDY OF THE RELATIONSHIP BETWEEN CRYSTAL-STRUCTURE AND PHOTOSENSITIVITY OF PHTHALOCYANINE PIGMENTS", Journal of imaging science and technology, 37(6), 1993, pp. 607-609

Abstract

Comparing the crystal structures of TiOPc phase I, TiOPc phase II, C-form TiOPc, Y-form TiOPc, VOPc phase II, X-form H2Pc, alpha-form H2Pc,and beta-form H2PC, we found a molecular overlapping pattern that is common to the highly photosensitive pigments. The relationship betweenthis molecular overlapping pattern and photosensitivity of pigments was explained in terms of the positional relationship of transition moments.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 06/07/20 alle ore 05:17:00