Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION OF MGAL2O4 THIN-FILMS FOR HUMIDITY SENSORS
Autore:
MATTOGNO G; RIGHINI G; MONTESPERELLI G; TRAVERSA E;
Indirizzi:
CNR,IST CHIM MAT,CP 10,00016 MONTEROTONDO STN ROME ITALY UNIV ROMA TOR VERGATA,DIPARTIMENTO SCI & TECNOL CHIM I-00133 ROME ITALY
Titolo Testata:
Journal of materials research
fascicolo: 6, volume: 9, anno: 1994,
pagine: 1426 - 1433
SICI:
0884-2914(1994)9:6<1426:XPIOMT>2.0.ZU;2-J
Fonte:
ISI
Lingua:
ENG
Soggetto:
ELECTRICAL-PROPERTIES; GAS SENSORS; CMOS TECHNOLOGY; AUGER PARAMETER; TIN DIOXIDE; ALUMINUM; MICROSTRUCTURE; ATMOSPHERE; CONDUCTION; IMPEDANCE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
56
Recensione:
Indirizzi per estratti:
Citazione:
G. Mattogno et al., "X-RAY PHOTOELECTRON-SPECTROSCOPY INVESTIGATION OF MGAL2O4 THIN-FILMS FOR HUMIDITY SENSORS", Journal of materials research, 9(6), 1994, pp. 1426-1433

Abstract

MgAl2O4 thin films, to be studied as active elements for humidity sensors, were deposited on Si/SiO2 substrates by radio-frequency sputtering. This paper discusses the x-ray photoelectron spectroscopy (XPS) investigation of these films. XPS demonstrated that the thin films had astoichiometry close to that Of MgAl2O4. The evaluation of the modified Auger parameter alpha' for Al gave structural information about the order of the crystalline structure of the thin films. The combination of Ar+ ion etching and XPS analysis showed the simultaneous presence of Mg, Al, and Si at the film-substrate interface. The thicknesses of the interfaces were calculated between 7 and 10 nm. The analysis of thebinding energy (b.e.) values of the XPS peaks at different etching depths showed that O 1s and Si 2p b.e. values were characteristic of a silicate at the interface, whereas in the substrate they were typical of silica. This suggests a chemical interaction took place between filmand substrate with the formation of a silicate layer at the interface, which may be the cause of the good adhesion Of MgAl2O4 films to silica, as observed by peel tests with Scotch tape.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 20/09/20 alle ore 04:52:16