Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
STUDIES ON POSITIVE-ION BEHAVIOR IN REACTIVE SPUTTERING OF YTTRIA-STABILIZED ZIRCONIA (YSZ)
Autore:
HATA T; MATSUDA H; ANDO R; HORITA S;
Indirizzi:
KANAZAWA UNIV,FAC TECHNOL,DEPT ELECT & COMP ENGN,2-40-20 KODATSUNO KANAZAWA ISHIKAWA 920 JAPAN
Titolo Testata:
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS
fascicolo: 3B, volume: 33, anno: 1994,
pagine: 120000455 - 120000458
SICI:
0021-4922(1994)33:3B<120000455:SOPBIR>2.0.ZU;2-Q
Fonte:
ISI
Lingua:
ENG
Soggetto:
THIN-FILMS; MAGNETRON;
Keywords:
YTTRIA-STABILIZED ZIRCONIA (YSZ); REACTIVE SPUTTER DEPOSITION; GLOW DISCHARGE MASS SPECTROSCOPY; POSITIVE IONS IN REACTIVE SPUTTERING; OXIDE FILM DEPOSITION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
12
Recensione:
Indirizzi per estratti:
Citazione:
T. Hata et al., "STUDIES ON POSITIVE-ION BEHAVIOR IN REACTIVE SPUTTERING OF YTTRIA-STABILIZED ZIRCONIA (YSZ)", JPN J A P 2, 33(3B), 1994, pp. 120000455-120000458

Abstract

Yttria-stabilized zirconia (YSZ) thin films were deposited by reactive sputtering. Various hysteresis curves, such as those in deposition rate and discharge voltage, were observed as functions of oxygen flow rate: The O2+, Zr+, Y+, YO+, ZrO+, ZrO2+ ions incident on the substratewere analyzed by a quadrupole mass spectrometer (QMS) and their behavior during the course of deposition was observed in detail. It is concluded that the Y/Zr ratio in the metallic film is exactly estimated asthe arrival ratio of Y+/Zr+.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 29/03/20 alle ore 09:12:22