Catalogo Articoli (Spogli Riviste)

OPAC HELP

Titolo:
IN-SITU CHARACTERIZATION OF ALE GROWTH BY REAGENT PULSE DELAY TIMES IN A FLOW-TYPE REACTOR
Autore:
AARIK J; AIDLA A; KUKLI K;
Indirizzi:
TARTU STATE UNIV,INST EXPTL PHYS & TECHNOL 2400 TARTU ESTONIA
Titolo Testata:
Applied surface science
, volume: 75, anno: 1994,
pagine: 180 - 184
SICI:
0169-4332(1994)75:<180:ICOAGB>2.0.ZU;2-R
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL-VAPOR-DEPOSITION; LAYER EPITAXY; GAAS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
16
Recensione:
Indirizzi per estratti:
Citazione:
J. Aarik et al., "IN-SITU CHARACTERIZATION OF ALE GROWTH BY REAGENT PULSE DELAY TIMES IN A FLOW-TYPE REACTOR", Applied surface science, 75, 1994, pp. 180-184

Abstract

Time delays of reagent gas pulses which occur in the flow-type atomiclayer epitaxy reactor were studied. It was shown that the time delaysdepend on the source temperature, reactor geometry and reactor temperature and characterize the growth process as well as the growing film. First of all, the surface density of adsorbed precursor molecules andthe constituent element mole ratio can be obtained from time delay measurements.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 28/11/20 alle ore 12:12:46