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Titolo:
MORPHOLOGICAL INSTABILITY OF BILAYERS OF COPPER GERMANIDE FILMS AND AMORPHOUS-GERMANIUM
Autore:
DOYLE JP; SVENSSON BG; JOHANSSON S;
Indirizzi:
ROYAL INST TECHNOL,POB E229 S-16440 KISTA SWEDEN UNIV UPPSALA,DEPT TECHNOL,DIV SCI MAT S-75121 UPPSALA SWEDEN
Titolo Testata:
Applied physics letters
fascicolo: 19, volume: 67, anno: 1995,
pagine: 2804 - 2806
SICI:
0003-6951(1995)67:19<2804:MIOBOC>2.0.ZU;2-S
Fonte:
ISI
Lingua:
ENG
Soggetto:
THIN-FILMS; CRYSTALLIZATION; TEMPERATURES; SI;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
17
Recensione:
Indirizzi per estratti:
Citazione:
J.P. Doyle et al., "MORPHOLOGICAL INSTABILITY OF BILAYERS OF COPPER GERMANIDE FILMS AND AMORPHOUS-GERMANIUM", Applied physics letters, 67(19), 1995, pp. 2804-2806

Abstract

The morphological instability of copper germanide (Cu3Ge) films in contact with amorphous germanium is reported. Through secondary ion massspectrometry, x-ray diffraction, transmission electron microscopy, and electrical measurements, the breakdown of the continuous layer has been monitored. On the contrary, with Cu3Ge in contact with single crystal germanium, no instability is observed at the same temperature. Thecrystallization of the amorphous germanium appears to be the mechanism responsible for the instability. (C) 1995 American Institute of Physics.

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Documento generato il 23/09/20 alle ore 20:21:10