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Titolo:
INTERFACE INSTABILITY IN AN ELECTRIC-FIELD
Autore:
KLINGER L; LEVIN L;
Indirizzi:
TECHNION ISRAEL INST TECHNOL,DEPT MAT ENGN IL-32000 HAIFA ISRAEL
Titolo Testata:
Journal of applied physics
fascicolo: 3, volume: 78, anno: 1995,
pagine: 1669 - 1672
SICI:
0021-8979(1995)78:3<1669:IIIAE>2.0.ZU;2-E
Fonte:
ISI
Lingua:
ENG
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
11
Recensione:
Indirizzi per estratti:
Citazione:
L. Klinger e L. Levin, "INTERFACE INSTABILITY IN AN ELECTRIC-FIELD", Journal of applied physics, 78(3), 1995, pp. 1669-1672

Abstract

We have studied morphological changes of an interface in a strong electric field which is normal to the initially planar interface. Electromigration along the interface in a two phase metallic system A-B of the immiscible components has been considered. The stresses arising during electromigration of the components were taken into account. A nonlinear equation has been derived for the interface evolution in the electric field, allowing for curvature of the interface. It was shown thatthe interface diffusion in an electric held leads to the formation ofa periodic corrugation on the interface if the components are distinguished by their electric charges. The corrugation increases with time and is transformed into a channel-hillock-like structure. The nonlinear equation was analyzed numerically for the steady-state case. The shape and the growth rate of hillocks on the interface have been calculated. (C) 1995 American Institute of Physics.

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Documento generato il 03/07/20 alle ore 16:49:33