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Titolo:
WHAT DETERMINES THE PROBING DEPTH OF ELECTRON YIELD XAS
Autore:
SCHROEDER SLM; MOGGRIDGE GD; ORMEROD RM; RAYMENT T; LAMBERT RM;
Indirizzi:
UNIV CAMBRIDGE,DEPT CHEM,LENSFIELD RD CAMBRIDGE CB2 1EW ENGLAND UNIV CAMBRIDGE,DEPT CHEM CAMBRIDGE CB2 1EW ENGLAND UNIV KEELE,DEPT CHEM KEELE ST5 5BG STAFFS ENGLAND
Titolo Testata:
Surface science
fascicolo: 2-3, volume: 324, anno: 1995,
pagine: 371 - 377
SICI:
0039-6028(1995)324:2-3<371:WDTPDO>2.0.ZU;2-6
Fonte:
ISI
Lingua:
ENG
Soggetto:
ABSORPTION FINE-STRUCTURE; ATMOSPHERIC-PRESSURE; SURFACE EXAFS; RAY; SPECTROSCOPY; IONIZATION; SATELLITES; SPECTRA; AUGER;
Tipo documento:
Letter
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
31
Recensione:
Indirizzi per estratti:
Citazione:
S.L.M. Schroeder et al., "WHAT DETERMINES THE PROBING DEPTH OF ELECTRON YIELD XAS", Surface science, 324(2-3), 1995, pp. 371-377

Abstract

Comparative Ni K-edge (8332.8 eV) total electron-yield (TEY) and conversion electron-yield (CEY) XAS spectra were collected from Ni wafers covered by NiO of varying thickness. In contrast to previous predictions, the surface sensitivity of TEY detection was found to be actually higher than for CEY detection. Examination of signal amplification factors upon switching from TEY to CEY detection indicates that the role of the surface insensitive inelastic KLL Auger electrons has been underestimated in the past. These energetic electrons constitute a major component of the emitted flux which is selectively amplified in CEY mode. Analysis of the TEY attenuation characteristics can be carried out solely in terms of Auger electron penetration ranges.

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Documento generato il 05/12/20 alle ore 01:22:47