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Titolo:
CHARACTERIZATION OF VAPOR-PHASE GROWTH USING X-RAY TECHNIQUES
Autore:
KISKER DW; STEPHENSON GB; FUOSS PH; BRENNAN S;
Indirizzi:
IBM CORP,DIV RES YORKTOWN HTS NY 10598 AT&T BELL LABS MURRAY HILL NJ 07974 STANFORD SYNCHROTRON RADIAT LAB MENLO PK CA 94025
Titolo Testata:
Journal of crystal growth
fascicolo: 1-4, volume: 146, anno: 1995,
pagine: 104 - 111
SICI:
0022-0248(1995)146:1-4<104:COVGUX>2.0.ZU;2-X
Fonte:
ISI
Lingua:
ENG
Soggetto:
EPITAXIAL-GROWTH; SURFACE RECONSTRUCTIONS; ELECTRON-DIFFRACTION; SCATTERING;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
16
Recensione:
Indirizzi per estratti:
Citazione:
D.W. Kisker et al., "CHARACTERIZATION OF VAPOR-PHASE GROWTH USING X-RAY TECHNIQUES", Journal of crystal growth, 146(1-4), 1995, pp. 104-111

Abstract

Chemical vapor deposition environments, while technologically quite important, are difficult to study using traditional analytical probes, such as electron-based techniques and optical tools. In this work, we will describe some of the ways in which X-rays can be applied to understand not only the gas phase composition through fluorescence, but also surface processes such as nucleation and diffusion.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 24/09/20 alle ore 07:25:56