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Titolo:
INFLUENCE OF SURFACE OXYGEN ON CHEMORESISTANCE OF TIN OXIDE FILM
Autore:
KACIULIS S; MATTOGNO G; GALDIKAS A; MIRONAS A; SETKUS A;
Indirizzi:
CNR,IST CHIM MAT I-00016 MONTEROTONDO SCALO ITALY LITHUANIA ACAD SCI,INST SEMICOND PHYS LT-2600 VILNIUS LITHUANIA
Titolo Testata:
Journal of vacuum science & technology. A. Vacuum, surfaces, and films
fascicolo: 6, volume: 14, anno: 1996,
pagine: 3164 - 3168
SICI:
0734-2101(1996)14:6<3164:IOSOOC>2.0.ZU;2-A
Fonte:
ISI
Lingua:
ENG
Soggetto:
GAS SENSORS; SNOX FILMS; CONDUCTIVITY; CHEMISTRY; TRENDS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
20
Recensione:
Indirizzi per estratti:
Citazione:
S. Kaciulis et al., "INFLUENCE OF SURFACE OXYGEN ON CHEMORESISTANCE OF TIN OXIDE FILM", Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(6), 1996, pp. 3164-3168

Abstract

The oxygen controlled chemoresistance of tin oxide based gas sensors was investigated in the temperature range from 20 to 320 degrees C. Polycrystalline thin film gas sensors were fabricated by the reactive dc-magnetron sputtering. The parameters of the sensors were also modified by additional Pt or Sb doping. The effect of surface oxygen species on the chemoresistance was studied by x-ray photoelectron spectroscopic (XPS) analysis of the surface chemical composition before and after different sample treatments. The oxygen peak at a binding energy 531.8eV in the XPS core level spectrum was found to be related to the chemisorbed molecular oxygen O-2(-). The variation of an amount of the O-2(-) species is found to be the main cause of gas sensitivity of tin oxide films at temperatures from 20 to 230 degrees C. (C) 1996 American Vacuum Society.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 03/12/20 alle ore 21:56:45