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Titolo:
IN-SITU AND REAL-TIME STUDY OF AN ELECTRODE PROCESS BY DIFFERENTIAL X-RAY-DIFFRACTION .2. CU UNDERPOTENTIAL DEPOSITION ON AU(111)
Autore:
CHABALA ED; CAIRNS J; RAYMENT T;
Indirizzi:
UNIV CAMBRIDGE,CHEM LAB,DEPT CHEM,LENSFIELD RD CAMBRIDGE CB2 1EW ENGLAND UNIV CAMBRIDGE,CHEM LAB,DEPT CHEM CAMBRIDGE CB2 1EW ENGLAND
Titolo Testata:
Journal of electroanalytical chemistry [1992]
fascicolo: 1-2, volume: 412, anno: 1996,
pagine: 77 - 84
Fonte:
ISI
Lingua:
ENG
Soggetto:
SCANNING-TUNNELING-MICROSCOPY; QUARTZ-CRYSTAL MICROBALANCE; ABSORPTION-SPECTROSCOPY; SURFACE EXAFS; AD-ATOMS; COPPER; GOLD; INTERFACES; GOLD(111); RHEED;
Keywords:
X-RAY DIFFRACTION; UNDERPOTENTIAL DEPOSITION; CU; IN SITU STUDY; REAL TIME STUDY;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
36
Recensione:
Indirizzi per estratti:
Citazione:
E.D. Chabala et al., "IN-SITU AND REAL-TIME STUDY OF AN ELECTRODE PROCESS BY DIFFERENTIAL X-RAY-DIFFRACTION .2. CU UNDERPOTENTIAL DEPOSITION ON AU(111)", Journal of electroanalytical chemistry [1992], 412(1-2), 1996, pp. 77-84

Abstract

The underpotential deposition of Cu on Au(111) was studied with X-raydiffraction in situ and in real time. Potentiodynamic and potential step modes of deposition were used and the adlayer spacing of Cu on Au(111) was determined as a function of potential and time respectively. In the latter case, a structural transition of the Cu adlayer was observed, consistent with changing from adsorption predominantly in the atop position to three-fold hollow sites on Au(111). A conventional laboratory source of X-rays was used.

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Documento generato il 01/12/20 alle ore 16:46:07