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Titolo:
STABILITY OF ADSORBED HYDROGEN ON SI(100) UNDER CHANGES OF THE SURFACE-POTENTIAL
Autore:
KRATZER P; HAMMER B; GREY F; NORSKOV JK;
Indirizzi:
TECH UNIV DENMARK,CTR ATOM SCALE MAT PHYS DK-2800 LYNGBY DENMARK TECH UNIV DENMARK,DEPT PHYS DK-2800 LYNGBY DENMARK JOINT RES CTR ATOM TECHNOL TSUKUBA IBARAKI 305 JAPAN TECH UNIV DENMARK,MIKROELEKT CTR DK-2800 LYNGBY DENMARK
Titolo Testata:
Surface review and letters
fascicolo: 2, volume: 3, anno: 1996,
pagine: 1227 - 1233
SICI:
0218-625X(1996)3:2<1227:SOAHOS>2.0.ZU;2-C
Fonte:
ISI
Lingua:
ENG
Soggetto:
SCANNING TUNNELING MICROSCOPE; ATOMIC-SCALE DESORPTION; H-2 DESORPTION; FABRICATION; DYNAMICS; MONOHYDRIDE; ADSORPTION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
37
Recensione:
Indirizzi per estratti:
Citazione:
P. Kratzer et al., "STABILITY OF ADSORBED HYDROGEN ON SI(100) UNDER CHANGES OF THE SURFACE-POTENTIAL", Surface review and letters, 3(2), 1996, pp. 1227-1233

Abstract

We study the effect of an electrostatic surface potential on the chemisorption energy of Hz on a Si(100)2 x 1 surface on the basis of a setof ab initio calculations. We find a sizeable destabilization of the adsorbate, because the clean surface gains in stability compared to the H-terminated surface due to charge transfer between dangling bonds and the space charge region below the surface. We rationalize our results in terms of a simple model and discuss the possibility that potential-induced destabilization is an important ingredient in understandingSTM-induced nanolithography.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 30/11/20 alle ore 10:13:21