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Titolo:
PROCESS-CONTROL BASED ON QUADRUPOLE MASS-SPECTROMETRY
Autore:
GREVE DW; KNIGHT TJ; CHENG X; KROGH BH; GIBSON MA; LABROSSE J;
Indirizzi:
CARNEGIE MELLON UNIV,DEPT ELECTR & COMP ENGN PITTSBURGH PA 15213 MKS INSTRUMENTS,NGS DIV WALPOLE MA 02081
Titolo Testata:
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
fascicolo: 1, volume: 14, anno: 1996,
pagine: 489 - 493
SICI:
1071-1023(1996)14:1<489:PBOQM>2.0.ZU;2-#
Fonte:
ISI
Lingua:
ENG
Soggetto:
PLASMA;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
10
Recensione:
Indirizzi per estratti:
Citazione:
D.W. Greve et al., "PROCESS-CONTROL BASED ON QUADRUPOLE MASS-SPECTROMETRY", Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 489-493

Abstract

Real-time feedback control of semiconductor processes based on in situ sensors can complement present statistical process control techniques. In this article, we explore the potential of quadrupole mass spectrometry as an in situ sensing technique. We show that it is possible tosense the fluxes of important species in a plasma process and use these measurements to implement a multivariable control scheme. As an example, the control of hydrogen, unreacted ammonia, and direct current bias in a plasma enhanced chemical vapor deposition silicon nitride process is demonstrated. (C) 1996 American Vacuum Society.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 07/07/20 alle ore 04:22:21