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Titolo:
LASER-ASSISTED DEPOSITION OF PURE GOLD FROM (CH3)(2)AU(HEXAFLUOROACETYLACETONATE) AND GAS-PHASE LUMINESCENCE IDENTIFICATION OF PHOTOFRAGMENTS
Autore:
WEXLER D; ZINK JI; TUTT LW; LUNT SR;
Indirizzi:
UNIV CALIF LOS ANGELES,DEPT CHEM & BIOCHEM LOS ANGELES CA 90024 UNIV CALIF LOS ANGELES,DEPT CHEM & BIOCHEM LOS ANGELES CA 90024 HUGHES RES LABS MALIBU CA 90265
Titolo Testata:
Journal of physical chemistry
fascicolo: 51, volume: 97, anno: 1993,
pagine: 13563 - 13567
SICI:
0022-3654(1993)97:51<13563:LDOPGF>2.0.ZU;2-8
Fonte:
ISI
Lingua:
ENG
Soggetto:
CHEMICAL VAPOR-DEPOSITION; BEAM-INDUCED DEPOSITION; PHOTOCHEMICAL DECOMPOSITION; DIMETHYL(2,4-PENTANEDIONATO)GOLD(III);
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
30
Recensione:
Indirizzi per estratti:
Citazione:
D. Wexler et al., "LASER-ASSISTED DEPOSITION OF PURE GOLD FROM (CH3)(2)AU(HEXAFLUOROACETYLACETONATE) AND GAS-PHASE LUMINESCENCE IDENTIFICATION OF PHOTOFRAGMENTS", Journal of physical chemistry, 97(51), 1993, pp. 13563-13567

Abstract

Pure gold films are deposited on germanium, silicon, silicon dioxide,and quartz by photolyzing (CH3)(2)Au-(hexafluorbacetylacetonate) in the gas phase. Shiny gold films are deposited at low incident fluences (<5 mJ/cm(2)), whereas higher fluences yield dull brown deposits. The effects of the fluence and the repetition rate of the pulsed laser on the morphology of the deposited film are studied by using SEM. The film quality is analyzed by using XPS and Auger spectroscopic methods. Nodetectable carbon is found in either the gold or brown films, indicating that both ate pure gold with different surface morphologies. Luminescence in the gas phase is observed under the conditions used for thephotodeposition. The emission spectrum, containing two bands having well-resolved vibronic fine structure, originates from dimeric gold, Au-2. The spectroscopic identification of ligand-free gold indicates that there is a gas-phase photochemical component in the deposition process. Deposition mechanisms, including both a surface component and a gas-phase component, are discussed.

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Documento generato il 23/09/20 alle ore 15:00:08