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Titolo:
SEARCH OF HIGH-PERFORMANCE RESISTS FOR 50 KV SHAPED-BEAM EXPOSURE
Autore:
TAN ZCH; STIVERS T; LEM H; DIGIACOMO N; WOOD D;
Indirizzi:
ETEC SYST INC HAYWARD CA 94545
Titolo Testata:
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
fascicolo: 6, volume: 13, anno: 1995,
pagine: 2539 - 2544
SICI:
1071-1023(1995)13:6<2539:SOHRF5>2.0.ZU;2-U
Fonte:
ISI
Lingua:
ENG
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
8
Recensione:
Indirizzi per estratti:
Citazione:
Z.C.H. Tan et al., "SEARCH OF HIGH-PERFORMANCE RESISTS FOR 50 KV SHAPED-BEAM EXPOSURE", Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2539-2544

Abstract

A search was made to find a high-performance resist to manifest the high-resolution advantage of 50 kV electron-beam exposure. Four resistswere evaluated: Shipley SAL-601, AT&T/OCG CAMP-6, LBM KRS, and IBM TNS. All resists were found to have high contrast >3 and were capable ofresolving <0.25 mu m line/space pairs at 3000 Angstrom thickness. With the exception of TNS, the resists demonstrate a high bulk sensitivity of <15 mu C/cm(2) at 50 kV. The IBM KRS resist was found to have thehighest figure of merit. It was capable of resolving less than 0.10 mu m line/space at 4000 Angstrom thickness. Furthermore, at 8000-10000 Angstrom, a resolution of less than or equal to 0.25 mu m was obtainedwith a steep profile. The dry etch resistance of the resist relative to chrome was 2.4:1. This resist is not environmentally sensitive and needs no postexposure bake treatment. If KRS is made commercially available, it will be an outstanding resist for modern electron beam/x-raymask making and direct write for device fabrication. (C) 1995 American Vacuum Society.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 05/12/20 alle ore 23:01:55