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Titolo:
RECENT DEVELOPMENTS IN SECONDARY-ELECTRON IMAGING
Autore:
HOWIE A;
Indirizzi:
CAVENDISH LAB,MADINGLEY RD CAMBRIDGE CB3 OHE ENGLAND
Titolo Testata:
Journal of Microscopy
, volume: 180, anno: 1995,
parte:, 3
pagine: 192 - 203
SICI:
0022-2720(1995)180:<192:RDISI>2.0.ZU;2-9
Fonte:
ISI
Lingua:
ENG
Soggetto:
EMISSION; RESOLUTION; MICROSCOPE; SPECTROSCOPY; COINCIDENCE; SURFACES; BOMBARDMENT; PARTICLES; SOLIDS; LAYERS;
Keywords:
SECONDARY EMISSIONS; COINCIDENCE DETECTION; ESCAPE DEPTH; WORK FUNCTION;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
45
Recensione:
Indirizzi per estratti:
Citazione:
A. Howie, "RECENT DEVELOPMENTS IN SECONDARY-ELECTRON IMAGING", Journal of Microscopy, 180, 1995, pp. 192-203

Abstract

Some recent experimental and theoretical developments in secondary electron (SE) imaging are reviewed. Coincidence experiments identify inner-shell excitations and single electron valence excitations often as more significant initial events in SE production than the more delocalized process of plasmon generation. Quantitative measurement and interpretation of escape depths in different materials are now becoming possible. Local variations in surface barrier height or work function canbe imaged, e.g. at p-n junctions in semiconductors, especially if theeffects of external patch fields are overcome.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 11/07/20 alle ore 04:28:28