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Titolo:
ATOMIC LAYER DEPOSITION IN TRAVELING-WAVE REACTOR - IN-SITU DIAGNOSTICS BY OPTICAL REFLECTION
Autore:
ROSENTAL A; ADAMSON P; GERST A; KOPPEL H; TARRE A;
Indirizzi:
ESTONIAN ACAD SCI,INST PHYS,RIIA 142 EE-2400 TARTU ESTONIA
Titolo Testata:
Applied surface science
, volume: 112, anno: 1997,
pagine: 82 - 86
SICI:
0169-4332(1997)112:<82:ALDITR>2.0.ZU;2-K
Fonte:
ISI
Lingua:
ENG
Keywords:
ATOMIC LAYER DEPOSITION; TRAVELING-WAVE REACTOR; IN SITU DIAGNOSTICS; OPTICAL REFLECTION; TIO2 THIN FILMS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
5
Recensione:
Indirizzi per estratti:
Citazione:
A. Rosental et al., "ATOMIC LAYER DEPOSITION IN TRAVELING-WAVE REACTOR - IN-SITU DIAGNOSTICS BY OPTICAL REFLECTION", Applied surface science, 112, 1997, pp. 82-86

Abstract

The traveling-wave reactor is an effective instrument for performing atomic layer deposition (ALD). In this paper, the use of a Brewster-angle interferometric reflectance technique for in situ real-time monitoring of ALD growth of transparent thin films on transparent and non-transparent substrates in suited traveling-wave reactors is proposed andanalyzed on the basis of a classical four-phase approximation. An appropriate experimental reactor system is described. The technique is applied to the diagnostics of TiO2 growth from TiCl4 and H2O. Features of the reflectance signal in the conditions of time-homogeneous ALD growth are discussed.

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Documento generato il 28/11/20 alle ore 04:17:28