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Titolo:
OBSERVED SUBSTRATE TOPOGRAPBY-MEDIATED LATERAL PATTERNING OF DIBLOCK COPOLYMER FILMS
Autore:
FASOLKA MJ; HARRIS DJ; MAYES AM; YOON M; MOCHRIE SGJ;
Indirizzi:
MIT,DEPT MAT SCI & ENGN CAMBRIDGE MA 02139 MIT,DEPT PHYS CAMBRIDGE MA 02139
Titolo Testata:
Physical review letters
fascicolo: 16, volume: 79, anno: 1997,
pagine: 3018 - 3021
SICI:
0031-9007(1997)79:16<3018:OSTLPO>2.0.ZU;2-6
Fonte:
ISI
Lingua:
ENG
Soggetto:
BLOCK-COPOLYMERS; SURFACES; MORPHOLOGY; THICKNESS;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Citazioni:
23
Recensione:
Indirizzi per estratti:
Citazione:
M.J. Fasolka et al., "OBSERVED SUBSTRATE TOPOGRAPBY-MEDIATED LATERAL PATTERNING OF DIBLOCK COPOLYMER FILMS", Physical review letters, 79(16), 1997, pp. 3018-3021

Abstract

We study the morphology of symmetric diblock copolymer films with thicknesses below the bulk equilibrium period supported by both flat and corrugated substrates. In this thickness regime, the film morphology is characterized by the formation of uniformly sized lateral domains. On flat substrates, these domains are randomly arranged. In contrast, on corrugated substrates, similar films exhibit domains which decorate the peaks of the substrate corrugations. Our observations suggest a novel and simple scheme for the lateral nanometer scale patterning of diblock copolymer films.

ASDD Area Sistemi Dipartimentali e Documentali, Università di Bologna, Catalogo delle riviste ed altri periodici
Documento generato il 30/09/20 alle ore 08:53:29