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Titolo:
EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION
Autore:
AARIK J; AIDLA A; KIISLER AA; UUSTARE T; SAMMELSELG V;
Indirizzi:
TARTU STATE UNIV,INST MAT SCI,18 ULIKOOLI ST EE-2400 TARTU ESTONIA ESTONIAN ACAD SCI,INST PHYS EE-2400 TARTU ESTONIA
Titolo Testata:
Thin solid films
fascicolo: 1-2, volume: 305, anno: 1997,
pagine: 270 - 273
SICI:
0040-6090(1997)305:1-2<270:EOCOOO>2.0.ZU;2-U
Fonte:
ISI
Lingua:
ENG
Soggetto:
DIOXIDE THIN-FILMS; EPITAXY;
Keywords:
OPTICAL PROPERTIES; STRUCTURAL PROPERTIES; TITANIUM OXIDE;
Tipo documento:
Article
Natura:
Periodico
Settore Disciplinare:
Science Citation Index Expanded
Science Citation Index Expanded
Science Citation Index Expanded
Citazioni:
16
Recensione:
Indirizzi per estratti:
Citazione:
J. Aarik et al., "EFFECT OF CRYSTAL-STRUCTURE ON OPTICAL-PROPERTIES OF TIO2 FILMS GROWNBY ATOMIC LAYER DEPOSITION", Thin solid films, 305(1-2), 1997, pp. 270-273

Abstract

The dependence of optical characteristics on the structure of atomic-layer-deposited titania (TiO2) thin films is studied. Amorphous films grown at 100 degrees C have an optical band gap of 3.3 eV while the refractive index values of these films range from 2.2 to 2.3 at a wavelength of 633 nm. The refractive index can be increased up to 2.65 by using the growth temperatures about 300 degrees C. Composition and structure studies reveal that the formation of preferentially oriented crystal (anatase) structure contributes to this increase of refractive index most significantly. (C) 1997 Elsevier Science S.A.

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Documento generato il 04/12/20 alle ore 19:46:13